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Vapor phase doping and sub-melt laser anneal for the fabrication of Si-based ultra-shallow junctions in sub-32 nm CMOS technology

Nguyen, Ngoc Duy; Rosseel, Erik; Takeuchi, Shotaro et al.

2009 • In International Semiconductor Device Research Symposium, 2009

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Nguyen_ISDRS_2009.pdf

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