|Reference : Ultra-low p-type doping of epitaxial Si for CMOS imagers : Assessment of the background ...|
|Reports : Internal report|
|Engineering, computing & technology : Materials science & engineering|
|Ultra-low p-type doping of epitaxial Si for CMOS imagers : Assessment of the background doping level of the CVD reactor|
|Nguyen, Ngoc Duy [IMEC > > > >]|
|[en] Boron doping ; CVD reactor ; Epitaxial growth|
|Researchers ; Professionals|
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