Ultra-low p-type doping of epitaxial Si for CMOS imagers : Assessment of the background doping level of the CVD reactor

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Nguyen, Ngoc Duy

2009

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https://hdl.handle.net/2268/98544

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Keywords :

Boron doping; CVD reactor; Epitaxial growth

Disciplines :

Materials science & engineering

Author, co-author :

Language :

English

Title :

Ultra-low p-type doping of epitaxial Si for CMOS imagers : Assessment of the background doping level of the CVD reactor

Publication date :

2009

Report number :

PR08.0599

Available on ORBi :

since 09 September 2011

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