Reference : Ultra-low p-type doping of epitaxial Si for CMOS imagers : Assessment of the background ...
Reports : Internal report
Engineering, computing & technology : Materials science & engineering
http://hdl.handle.net/2268/98544
Ultra-low p-type doping of epitaxial Si for CMOS imagers : Assessment of the background doping level of the CVD reactor
English
Nguyen, Ngoc Duy mailto [IMEC > > > >]
2009
PR08.0599
[en] Boron doping ; CVD reactor ; Epitaxial growth
Researchers ; Professionals
http://hdl.handle.net/2268/98544

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