Reference : Heavy boron doping of epitaxial Si for TFET application : Non selective deposition

	Document type :	Reports : Internal report
	Discipline(s) :	Engineering, computing & technology : Materials science & engineering
	To cite this reference:	http://hdl.handle.net/2268/98543

Title :	Heavy boron doping of epitaxial Si for TFET application : Non selective deposition
Language :	English
Author, co-author :	Nguyen, Ngoc Duy [Université de Liège - ULg > Département de physique > Physique des solides, interfaces et nanostructures >]
Publication date :	2009
Report number :	PR07.0390
Keywords :	[en] Heavy doping ; Boron doping ; Non-selective epitaxial growth
Target :	Researchers ; Professionals
Permalink :	http://hdl.handle.net/2268/98543

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