Reference : Heavy boron doping of epitaxial Si for TFET application : Non selective deposition
Reports : Internal report
Engineering, computing & technology : Materials science & engineering
http://hdl.handle.net/2268/98543
Heavy boron doping of epitaxial Si for TFET application : Non selective deposition
English
Nguyen, Ngoc Duy mailto [Université de Liège - ULg > Département de physique > Physique des solides, interfaces et nanostructures >]
2009
PR07.0390
[en] Heavy doping ; Boron doping ; Non-selective epitaxial growth
Researchers ; Professionals
http://hdl.handle.net/2268/98543

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