Reference : Study of mechanical, physical and chemical properties of a-C:H films deposited by reacti...

	Document type :	Scientific congresses and symposiums : Poster
	Discipline(s) :	Physical, chemical, mathematical & earth Sciences : Multidisciplinary, general & others
	To cite this reference:	http://hdl.handle.net/2268/76771

Title :	Study of mechanical, physical and chemical properties of a-C:H films deposited by reactive magnetron sputtering in DC pulsed mode
Language :	English
Author, co-author :	Colaux, J. L. [ > > ]
	Dumont, D. [ > > ]
	Delwigne, T. [ > > ]
	Breur, E. [ > > ]
	Van Dievoet, F. [ > > ]
	Strivay, David [Université de Liège - ULg > Département de physique > Physique nucléaire, atomique et spectroscopie - Centre européen en archéométrie >]
	Dille, J. [ > > ]
	Lucas, S. [ > > ]
Publication date :	2010
Audience :	International
Event name :	12th International Conference on Plasma Surface Engineering
Event date :	13-17 septembre 2010
Event place (city) :	Garmisch-Partenkirchen
Event country :	Allemagne
Permalink :	http://hdl.handle.net/2268/76771

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