Reference : Epitaxial Si, SiGe and Ge for high-performance devices
Scientific congresses and symposiums : Unpublished conference
Engineering, computing & technology : Materials science & engineering
http://hdl.handle.net/2268/71424
Epitaxial Si, SiGe and Ge for high-performance devices
English
Loo, Roger mailto [IMEC > > > >]
Hikavyy, Andriy [IMEC > > > >]
Vincent, Benjamin [IMEC > > > >]
Wang, Gang [IMEC > > > >]
Vanherle, Wendy [IMEC > > > >]
Gencarelli, Federica [IMEC > > > >]
Nguyen, Ngoc Duy mailto [Université de Liège - ULg > Département de physique > Physique des solides, interfaces et nanostructures >]
Rosseel, Erik [IMEC > > > >]
Souriau, Laurent [IMEC > > > >]
Rondas, Dirk [IMEC > > > >]
Dekoster, Johan [IMEC > > > >]
Caymax, Matty [IMEC > > > >]
23-Sep-2010
No
Yes
International
ASM User Meeting
23/09/2010
ASM
Munich
Germany
[en] Epitaxy ; CVD ; Si ; Ge ; SiGe ; High-performance device
Researchers ; Professionals
http://hdl.handle.net/2268/71424

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