ORBi: Nguyen Ngoc Duy - Vapor phase doping and sub-melt laser anneal for ultra-shallow extension junctions in sub-32 nm CMOS technology

Reference : Vapor phase doping and sub-melt laser anneal for ultra-shallow extension junctions in su...


	Document type :	Scientific congresses and symposiums : Paper published in a book
	Discipline(s) :	Engineering, computing & technology : Electrical & electronics engineering
	To cite this reference:	http://hdl.handle.net/2268/69098

Title :	Vapor phase doping and sub-melt laser anneal for ultra-shallow extension junctions in sub-32 nm CMOS technology
Language :	English
Author, co-author :	Nguyen, Ngoc Duy [IMEC > > > >]
	Rosseel, Erik [IMEC > > > >]
	Takeuchi, Shotaro [IMEC > > > >]
	Everaert, Jean-Luc [IMEC > > > >]
	Loo, Roger [IMEC > > > >]
	Goossens, Jozefien [IMEC > > > >]
	Moussa, Alain [IMEC > > > >]
	Clarysse, Trudo [IMEC > > > >]
	Vandervorst, Wilfried [IMEC > > > >]
Publication date :	2009
Main document title :	SiNEP 2009. 1st International Workshop on Si based nano-electronics and -photonics
Editor :	Chiussi, S.
	Alpuim, P.
	Murota, J.
	Gonzalez, P.
	Serra, J.
	Leon, B.
Publisher :	NETBIBLO
Audience :	International
ISBN :	978-8497454162
Event name :	1st International Workshop on Si-based Nano-electronics and –photonics
Event date :	20-23/9/2009
Event organizer :	University of Vigo
Event place (city) :	Vigo
Event country :	Spain
Keywords :	[en] Vapor phase doping ; Laser anneal ; Ultra shallow junction
Target :	Researchers ; Professionals
Permalink :	http://hdl.handle.net/2268/69098

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