Reference : Vapor phase doping and sub-melt laser anneal for ultra-shallow extension junctions in...
Scientific congresses and symposiums : Paper published in a book
Engineering, computing & technology : Electrical & electronics engineering
http://hdl.handle.net/2268/69098
Vapor phase doping and sub-melt laser anneal for ultra-shallow extension junctions in sub-32 nm CMOS technology
English
Nguyen, Ngoc Duy mailto [IMEC > > > >]
Rosseel, Erik [IMEC > > > >]
Takeuchi, Shotaro [IMEC > > > >]
Everaert, Jean-Luc [IMEC > > > >]
Loo, Roger [IMEC > > > >]
Goossens, Jozefien [IMEC > > > >]
Moussa, Alain [IMEC > > > >]
Clarysse, Trudo [IMEC > > > >]
Vandervorst, Wilfried [IMEC > > > >]
2009
SiNEP 2009. 1st International Workshop on Si based nano-electronics and -photonics
Chiussi, S.
Alpuim, P.
Murota, J.
Gonzalez, P.
Serra, J.
Leon, B.
NETBIBLO
Yes
International
978-8497454162
1st International Workshop on Si-based Nano-electronics and –photonics
20-23/9/2009
University of Vigo
Vigo
Spain
[en] Vapor phase doping ; Laser anneal ; Ultra shallow junction
Researchers ; Professionals
http://hdl.handle.net/2268/69098

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