| III-V Devices for Advanced CMOS |
| English |
| Waldron, Niamh [IMEC > > > > > >] |
| Nguyen, Ngoc Duy [IMEC > > > >] |
| Lin, Dennis [IMEC > > > >] |
| Brammertz, Guy [IMEC > > > > > >] |
| Hellings, Geert [IMEC > > > > > >] |
| Vincent, Benjamin [IMEC > > > > > >] |
| Firrincieli, Andrea [IMEC > > > > > >] |
| Sioncke, Sonia [IMEC > > > > > >] |
| De Jaeger, Brice [IMEC > > > > > >] |
| Wang, Gang [IMEC > > > > > >] |
| Krom, Raymond [IMEC > > > > > >] |
| Mitard, Jérôme [IMEC > > > > > >] |
| Wang, Wei-E [IMEC > > > > > >] |
| Passlack, Matthias [IMEC > > > > > >] |
| Heyns, Marc [IMEC > > > > > >] |
| Caymax, Matty [IMEC > > > > > >] |
| Meuris, Marc [IMEC > > > > > >] |
| Biesemans, Serge [IMEC > > > > > >] |
| Hoffmann, Thomas [IMEC > > > > > >] |
| 2010 |
| 217th ECS Meeting |
| ECS |
| ECS Meeting Abstracts MA2010-01 |
| No |
| International |
| 2151-2043 |
| Pennington |
| USA |
| 217th ECS Meeting |
| 25-30/4/2010 |
| ECS |
| Vancouver |
| Canada |
| [en] III-V ; CMOS ; Device fabrication |
| Researchers ; Professionals |
| http://hdl.handle.net/2268/69096 |