Vapor phase doping: an atomic layer deposition approach to n-type doping in classical chemical vapor deposition epitaxy

Takeuchi, Shotaro; Nguyen, Ngoc Duy; Leys, Frederik; Loo, Roger; Conard, Thierry; Vandervorst, Wilfried; Caymax, Matty

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Vapor phase doping: an atomic layer deposition approach to n-type doping in classical chemical vapor deposition epitaxy

Takeuchi, Shotaro; Nguyen, Ngoc Duy; Leys, Frederik et al.

2008 • 8th International Conference on Atomic Layer Deposition (ALD)

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https://hdl.handle.net/2268/68720

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Keywords :

Vapor phase doping; Atomic layer epitaxy; n-Type doping

Disciplines :

Physics

Author, co-author :

Takeuchi, Shotaro; IMEC

Nguyen, Ngoc Duy ; IMEC

Leys, Frederik; IMEC

Loo, Roger; IMEC

Conard, Thierry; IMEC

Vandervorst, Wilfried; IMEC

Caymax, Matty; IMEC

Language :

English

Title :

Vapor phase doping: an atomic layer deposition approach to n-type doping in classical chemical vapor deposition epitaxy

Publication date :

2008

Event name :

8th International Conference on Atomic Layer Deposition (ALD)

Event organizer :

Technische Universiteit Eindhoven and IMEC

Event place :

Bruges, Belgium

Event date :

29/6-2/7/2008

Audience :

International

Available on ORBi :

since 12 August 2010

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