Reference : Conformal ultra shallow junctions by vapor phase doping with boron
Scientific congresses and symposiums : Poster
Engineering, computing & technology : Electrical & electronics engineering
http://hdl.handle.net/2268/68716
Conformal ultra shallow junctions by vapor phase doping with boron
English
Nguyen, Ngoc Duy mailto [IMEC > > > >]
Leys, Frederik [IMEC > > > >]
Takeuchi, Shotaro [IMEC > > > >]
Loo, Roger [IMEC > > > >]
Caymax, Matty [IMEC > > > >]
Eyben, Pierre [IMEC > > > >]
Vandervorst, Wilfried [IMEC > > > >]
2008
Yes
International
4th International SiGe Technology and Device Meeting (ISTDM)
11-14/5/2008
Nano Device Laboratories Taiwan
Hsinchu
Taiwan
[en] Vapor phase doping ; Conformal doping ; Ultra shallow junction ; FinFET ; Boron doping
Researchers ; Professionals
http://hdl.handle.net/2268/68716

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