Reference : Antireflective subwavelength patterning of IR optics
Scientific congresses and symposiums : Paper published in a journal
Physical, chemical, mathematical & earth Sciences : Physics
http://hdl.handle.net/2268/60493
Antireflective subwavelength patterning of IR optics
English
Vandormael, Denis [Université de Liège - ULG > > CSL (centre spatial de Liège) > >]
Habraken, Serge mailto [Université de Liège - ULg > Département de physique > Optique - Hololab - CSL (Centre Spatial de Liège) >]
Loicq, Jerôme mailto [Université de Liège - ULg > > CSL (Centre Spatial de Liège) >]
Lenaerts, Cedric mailto [Université de Liège - ULg > Departement de physique > Hololab > >]
mawet, Dimitri [Université de Liège - ULG > Astrophysique > > >]
2006
Proceedings of SPIE
International Society for Optical Engineering
6395
Yes
International
0277-786X
1996-756X
Bellingham
WA
[en] anti-reflection ; infrared ; moth-eye ; replication ; nano-imprint
[en] Thermal infrared (IR) lenses require efficient anti-reflection coating. Moth-eye (or egg-box) 2D subwavelength gratings have demonstrated their ability to reach a very high transmission for a wide wavelength and angular range. The use in thermal IR is simplified by the lower resolution for lithographic technology, compared to visible waveband. However, deeper structures must be engraved and lithography must be adapted to IR materials. In order to be cost-effective, the
patterning must be produced by replication techniques, such as embossing. Our laboratory is now experimenting hot embossing of moth-eye patterns in chalcogenide substrates. In this paper, theoretical analysis, micro-lithographic technology and manufacturing processes are detailed.
Researchers ; Professionals
http://hdl.handle.net/2268/60493

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