Reference : Experimental and simulation study of the Schottky barrier lowering by substrate doping v...
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Engineering, computing & technology : Electrical & electronics engineering
Physical, chemical, mathematical & earth Sciences : Physics
http://hdl.handle.net/2268/23642
Experimental and simulation study of the Schottky barrier lowering by substrate doping variation for PtSi Source/Drain SBFETs
English
Lousberg, Grégory mailto [Université de Liège - ULg & Interuniversity MicroElectronics Center (IMEC) > Dép. d'électric., électron. et informat. (Inst.Montefiore) > Electronique et microsystèmes > 3ème tech. >]
Yu, Hong-Yu [ > > ]
Froment, Benoit [ > > ]
Li, M.-F. [ > > ]
Augendre, E. [ > > ]
De Keersgieter, A. [ > > ]
Demeurisse, C. [ > > ]
Brus, S. [ > > ]
Degroote, B. [ > > ]
Hoffman, T. [ > > ]
Lauwers, A. [ > > ]
DePotter, M. [ > > ]
Kubicek, S. [ > > ]
Anil, K. [ > > ]
Jurczak, M. [ > > ]
Biesemans, S. [ > > ]
Sep-2006
Proceedings of ESSDERC 2006
Yes
International
Solid-State Device Research Conference, 2006. ESSDERC 2006.
[en] In this paper, the authors study experimentally and numerically the Schottky barrier height (SBH) lowering of Pt silicide/n-Si diodes and its implications to Schottky-barrier (SB) source/drain p-FETs. The authors demonstrate that hole SBH can be lowered through an image-force mechanism by increasing the n-Si substrate doping, which leads to a substantial gain of the drive current in the long-channel bulk p-SBFETs. Numerical simulations show that the channel doping concentration is also critical for short-channel n- & p-SOI SBFETs performance
http://hdl.handle.net/2268/23642

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