Patent (Patents)
Plasma deposition method for catechol/quinone functionalised layers
Detrembleur, Christophe; Van de Weerdt, Cécile; Vreuls, Christelle et al.
2016
 

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Detrembleur C 2016 Patent WO 2016050419 A2.pdf
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Keywords :
coating
Abstract :
[en] The invention provides a solvent-free plasma method for depositing an adherent catechol and/or quinone functionalised layer to an inorganic or organic substrate from a precursor which comprises at least a quinone group; a protected or unprotected catechol group; a molecule substituted by a quinone group and/or a protected or unprotected catechol group; and/or a natural or synthetic derivative of a catechol group and/or a quinone group; wherein the quinone group is a 1,2- benzoquinone group and the catechol group is a 1,2-dihydroxybenzene group.
Research center :
Center for Education and Research on Macromolecules (CERM)
Disciplines :
Chemistry
Materials science & engineering
Inventor :
Detrembleur, Christophe ;  University of Liège - ULiège > Department of Chemistry > Center for Education and Research on Macromolecules (CERM)
Van de Weerdt, Cécile ;  University of Liège (ULg), Giga-Research
Vreuls, Christelle;  University of Liège (ULg), Giga-Research
Mauchauffe, Rodolphe
Moreno-Couranjou, Maryline
Boscher, Nicolas
Choquet, Patrick
Language :
English
Title (54) :
Plasma deposition method for catechol/quinone functionalised layers
Publication date (43-45) :
07 April 2016
Filing date (22) :
24 August 2015
Patent/publication number (10-11) :
WO 2016050419
Patent status (13) :
A
Priority number (30) :
EP20140187218 20140930
International classification (IPC) (51) :
B05D1/00
European classification (ECLA) (52) :
B05D1/62; B05D5/00
Applicant (71) :
University of Liège (ULg)
Luxembourg Institute of Science and Technology
Publication organism (19) :
WIPO
Available on ORBi :
since 01 July 2016

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