Patent (Patents)
Method for manufacturing an improved optical layer of light emitting device with surface nano-micro texturation based on coherent electromagnetic radiation speckle lithography
Loicq, Jerôme; Fleury-Frenette, Karl; Vandormael, Denis
2012
 

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Keywords :
OLED; Spekle; Lithography
Abstract :
[en] An object of the present invention is to provide a cheap, rapid, controlled, reproducible and polyvalent method for manufacturing a light emitting device with an internal source of light capable of achieving an enhancement in extraction efficiency. The invention proposes a method for manufacturing an optical layer for a light emitting device having an internal source of light and an optical layer separating the internal source of light and an external medium of light diffusion, wherein the method comprises the use of coherent electromagnetic radiation speckle lithography, such as laser speckle lithography, to make a nano/micro texturation on at least one surface of the optical layer
Research center :
CSL - Centre Spatial de Liège - ULiège
Disciplines :
Physics
Inventor :
Loicq, Jerôme ;  Université de Liège - ULiège > CSL (Centre Spatial de Liège)
Fleury-Frenette, Karl ;  Université de Liège - ULiège > CSL (Centre Spatial de Liège)
Vandormael, Denis
Language :
English
Title (54) :
Method for manufacturing an improved optical layer of light emitting device with surface nano-micro texturation based on coherent electromagnetic radiation speckle lithography
Publication date (43-45) :
30 May 2012
Filing date (22) :
24 November 2010
Patent/publication number (10-11) :
EP2458412A1
Patent status (13) :
none
Priority number (30) :
EP10192455
International classification (IPC) (51) :
G02B5/02; H01L33/44
European classification (ECLA) (52) :
G02B5/02
Applicant (71) :
ULg - Université de Liège
Publication organism (19) :
EPO
Funders :
Région wallonne [BE]
Available on ORBi :
since 01 June 2012

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